Thermal decomposition pathway of Ge and Si oxides: observation of a distinct difference
- 1 July 2000
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 369 (1-2) , 289-292
- https://doi.org/10.1016/s0040-6090(00)00881-6
Abstract
No abstract availableKeywords
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