Repetitively pulsed metal ion beams for ion implantation
- 1 January 1985
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 6 (1-2) , 123-128
- https://doi.org/10.1016/0168-583x(85)90621-4
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Recent advances in the field of ion-induced kinetic electron emission from solidsVacuum, 1983
- Intense pulsed ion beams for fusion applicationsNuclear Fusion, 1980
- Ion beam annealing of semiconductorsApplied Physics Letters, 1980
- Microsecond-pulse insulation and intense ion beam generation in a magnetically insulated vacuum diodeApplied Physics Letters, 1977
- Mass Analysis of Ion Beams from a Low-Voltage Spark Ion Source for Ion-Implantation Doping of SemiconductorsJournal of Applied Physics, 1967
- THE VACUUM VIBRATOR AS A SOURCE OF IONS FOR MASS SPECTROSCOPYCanadian Journal of Physics, 1963
- Ion Sources for Mass SpectroscopyReview of Scientific Instruments, 1936