Reactive sticking coefficient of silane on the Si(111)-(7×7) Surface
- 10 February 1989
- journal article
- Published by Elsevier in Chemical Physics Letters
- Vol. 154 (6) , 505-510
- https://doi.org/10.1016/0009-2614(89)87141-6
Abstract
No abstract availableKeywords
This publication has 18 references indexed in Scilit:
- The role of surface reactions in monosilane pyrolysisThe Journal of Chemical Physics, 1988
- Reactive sticking coefficients for silane and disilane on polycrystalline siliconJournal of Applied Physics, 1988
- Low Temperature Silicon Epitaxy Deposited by Very Low Pressure Chemical Vapor Deposition: I . KineticsJournal of the Electrochemical Society, 1986
- Laser powered homogeneous pyrolysis of silaneChemical Physics Letters, 1985
- The surface chemistry of the thermal cracking of silane on silicon (111)Surface Science, 1984
- Some comments on kinetics and mechanism in the pyrolysis of monosilaneChemical Physics Letters, 1984
- The Kinetics of Silicon Deposition on Silicon by Pyrolysis of SilaneJournal of the Electrochemical Society, 1974
- Silicon homoepitaxial thin films via silane pyrolysis: A HEED and Auger electron spectroscopy studySurface Science, 1972
- A study of nucleation in chemically grown epitaxial silicon films using molecular beam techniques III. Nucleation rate measurements and the effect of oxygen on initial growth behaviourPhilosophical Magazine, 1967
- The pyrolysis of monosilaneProceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences, 1966