Si3N4 and Si2N2O for high performance radomes
- 1 May 1985
- journal article
- Published by Elsevier in Materials Science and Engineering
- Vol. 71, 265-272
- https://doi.org/10.1016/0025-5416(85)90236-8
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
- Deposition of silicon nitride from SiCl4 and NH3 in a low pressure r.f. plasmaThin Solid Films, 1983
- On the α to β phase transformation and grain growth during hot-pressing of Si3N4 containing MgOCeramurgia International, 1980
- Thermal Decomposition of the Oxynitride of SiliconJournal of the American Ceramic Society, 1980
- Mechanical Properties of Hot‐Pressed Silicon Nitride with Different Grain StructuresJournal of the American Ceramic Society, 1979
- Phase Relations in the System Si3N4‐SiO2‐MgO and Their Interrelation with Strength and OxidationJournal of the American Ceramic Society, 1978
- Pressureless sintering of Si3N4Journal of Materials Science, 1975
- Hot‐Pressing Behavior of Si3N4Journal of the American Ceramic Society, 1974
- Silicon Oxynitride StabilityScience, 1969