Deposition of silicon nitride from SiCl4 and NH3 in a low pressure r.f. plasma
- 1 September 1983
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 107 (2) , 181-189
- https://doi.org/10.1016/0040-6090(83)90020-2
Abstract
No abstract availableKeywords
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