Energetics of diffusion processes during nucleation and growth for the Cu/Cu(100) system
- 1 September 1994
- journal article
- Published by Elsevier in Surface Science
- Vol. 316 (3) , 294-302
- https://doi.org/10.1016/0039-6028(94)91221-1
Abstract
No abstract availableThis publication has 25 references indexed in Scilit:
- Self-diffusion mechanisms for adatoms on fcc(100) surfacesSurface Science, 1993
- Activation free energy and entropy for the normal and exchange selfdiffusion processes on Cu(100)Surface Science, 1993
- Nucleation and diffusion of Cu adatoms on Cu(100): A helium-atom-beam scattering studyPhysical Review B, 1992
- Migration of Cu adatoms on a Cu(100) surface, studied with low-energy ion scattering (LEIS)Surface Science, 1992
- Diffusion mechanisms on Ni surfacesSurface Science, 1992
- Atom incorporation at surface clusters: An atomic viewPhysical Review Letters, 1991
- Self-diffusion on copper surfacesPhysical Review B, 1991
- Scaling of the (√3 × √3 )R30° domain-size distribution with coverage for Ag/Si(111)Physical Review Letters, 1991
- Diffusion path for an Al adatom on Al(001)Physical Review Letters, 1990
- The surface morphology of a growing crystal studied by thermal energy atom scattering (TEAS)Surface Science, 1987