Energy Level of the 0 to + Charge Transition of Substitutional Manganese in Silicon
- 12 August 1985
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 55 (7) , 758-760
- https://doi.org/10.1103/physrevlett.55.758
Abstract
An energy level of eV related to the 0 to + charge transition of substitutional manganese in silicon has been determined with a combination of deep-level-transient spectroscopy and ESR measurements. There is no evidence for ordinary amphoteric or negative- behavior in the lower half of the band gap. This is the first identified energy level of a substitutional impurity in silicon.
Keywords
This publication has 6 references indexed in Scilit:
- Energy levels of interstitial manganese in siliconSolid State Communications, 1983
- Transition metals in siliconApplied Physics A, 1983
- Level positions of interstitial transition-metal impurities in siliconPhysical Review B, 1982
- Energy levels and solubility of interstitial chromium in siliconApplied Physics Letters, 1981
- Eigensehaften der Dotierungsniveaus von Mangan und Vanadium in SiliziumPhysica Status Solidi (a), 1981
- Deep-level transient spectroscopy: A new method to characterize traps in semiconductorsJournal of Applied Physics, 1974