Total dose characterization of a CMOS technology at high dose rates and temperatures
- 1 January 1988
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Nuclear Science
- Vol. 35 (6) , 1557-1562
- https://doi.org/10.1109/23.25497
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
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