The Influence of Fluorine Desorption from ECR-CVD SiOF Film
- 1 January 1997
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Dielectric Constant and Stability of Fluorine‐Doped Plasma Enhanced Chemical Vapor Deposited SiO2 Thin FilmsJournal of the Electrochemical Society, 1996
- Mechanisms of Surface Reaction in Fluorocarbon Dry Etching of Silicon Dioxide-An Effect of Thermal ExcitationJapanese Journal of Applied Physics, 1992