Diffusion of nitrogen in α-Ti

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Abstract
The diffusion coefficients of nitrogen in polycrystalline α‐Ti have been measured by annealing nitrogen‐implanted titanium samples in the low‐temperature region, i.e., 450–700 °C. The nitrogen profiles were probed with the ( p,γ) resonance broadening method. The implantation energies were 20–60 keV and the fluences were 1016–1018 ion/cm2, corresponding to 1.4 and 14 at. % at the maximum of the N profile, respectively. The concentration change had only a slight effect on the diffusivity. The irradiation effect on the diffusivity was studied by bombarding the samples with 20–60 keV 22Ne+ ions with 1016–1018 ion/cm2 fluences and 600–keV protons with a 1018 proton/cm2 fluence. However, no significant change was observed.