Chemical vapor deposition in high-density low-pressure plasmas: reactor scale-up and performance
- 1 April 1994
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 241 (1-2) , 240-246
- https://doi.org/10.1016/0040-6090(94)90433-2
Abstract
No abstract availableKeywords
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