Preparation of low resistivity tungsten thin films deposited by microwave-plasma-enhanced chemical vapour deposition from the tungsten hexafluoride-hydrogen system
- 1 April 1994
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 241 (1) , 301-304
- https://doi.org/10.1016/0040-6090(94)90446-4
Abstract
No abstract availableKeywords
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