Measurement of the sputtering yield for Ar+ and Ar2+ ions on gold films
- 1 January 1982
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 87 (4) , 379-383
- https://doi.org/10.1016/0040-6090(82)90291-7
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- Mechanism of sputtering of solid surfaces by ion-impactNature, 1978
- Ion etching for pattern delineationJournal of Vacuum Science and Technology, 1976
- A saddle field ion source of spherical configuration for etching and thinning applicationsVacuum, 1974
- Sputtering of Silicon withIonsPhysical Review B, 1961
- Sputtering of Silver by Neutral Beams of Hydrogen and HeliumThe Journal of Chemical Physics, 1958