Conditions for the routine preparation of tantalum/aluminium films
- 31 March 1975
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 26 (1) , 77-98
- https://doi.org/10.1016/0040-6090(75)90168-6
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Annealing and phase stability of tantalum films sputtered in Ar-O2Thin Solid Films, 1974
- Tantalum thin film resistorsThin Solid Films, 1972
- Compositional Control of Tantalum–Aluminum Alloy Films by a dc Biased, ac Sputtering TechniqueJournal of Vacuum Science and Technology, 1972
- Electrical and Structural Properties of Co-Sputtered Tantalum–Aluminum FilmsJournal of Vacuum Science and Technology, 1969
- GOBBLEDEGOOK?The Medical Journal of Australia, 1967