In-situ investigations of radical kinetics in the deposition of hydrogenated amorphous silicon films
- 28 February 1993
- journal article
- Published by Elsevier in Materials Science and Engineering: B
- Vol. 17 (1-3) , 68-71
- https://doi.org/10.1016/0921-5107(93)90081-w
Abstract
No abstract availableKeywords
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