Hydrogen content and mechanical stress in glow discharge amorphous silicon
- 1 August 1982
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research
- Vol. 199 (1-2) , 421-425
- https://doi.org/10.1016/0167-5087(82)90246-0
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
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- Physicochemical Properties of Chemical Vapor‐Deposited Silicon Oxynitride from a SiH4 ‐ CO 2 ‐ NH 3 ‐ H 2 SystemJournal of the Electrochemical Society, 1978
- Nondestructive Analysis for Trace Amounts of HydrogenJournal of Applied Physics, 1972