Ion energy distributions in radio-frequency discharges
- 1 July 1991
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 70 (1) , 82-92
- https://doi.org/10.1063/1.350247
Abstract
Using a theoretical description of potentials in radio-frequency (rf) discharges reported elsewhere [Song, Field, and Klemperer, J. Phys. D: Appl. Phys. 23, 673 (1990)] we derive the equations of motion for ions from the plasma region striking the cathode and anode in the absence of collisions in the sheath. We compute ion energy distributions (IEDs) which we find to be in excellent agreement with recent experimental data for Ar, Ar/H2 mixtures, O2, and CF4 parent gases. We also present a method of estimating IEDs which does not involve extensive computation, a development of particular value in the design of reactive ion etching processes.This publication has 19 references indexed in Scilit:
- Electrical potentials in RF dischargesJournal of Physics D: Applied Physics, 1990
- A charged-particle analyzer for radio-frequency dischargesJournal of Vacuum Science & Technology A, 1989
- Structured ion energy distribution in radio frequency glow-discharge systemsApplied Physics Letters, 1989
- Ion and electron energy analysis at a surface in an RF dischargeJournal of Physics D: Applied Physics, 1988
- Ion energy measurement at the powered electrode in an rf dischargeJournal of Applied Physics, 1988
- Energy Distribution of Ions in Plasma Etching ReactorsMRS Proceedings, 1986
- Plasma potentials of 13.56-MHz rf argon glow discharges in a planar systemJournal of Applied Physics, 1985
- Positive-ion bombardment of substrates in rf diode glow discharge sputteringJournal of Applied Physics, 1972
- Application of RF Discharges to SputteringIBM Journal of Research and Development, 1970
- Calculation of Ion Bombarding Energy and Its Distribution in rf SputteringPhysical Review B, 1968