Investigation of phase growth kinetics in the system of Si single crystals and V thin films
- 16 July 1976
- journal article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 36 (1) , K89-K91
- https://doi.org/10.1002/pssa.2210360168
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- Investigation of reactive diffusion in the thin-film system Cu-TiPhysica Status Solidi (a), 1975
- Kinetics of silicide formation by thin films of V on Si and SiO2 substratesJournal of Applied Physics, 1974
- Formation of vanadium silicides by the interactions of V with bare and oxidized Si wafersApplied Physics Letters, 1973