Chemical plasma etching of Y-Ba-Cu-oxide thin films
- 15 December 1991
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 70 (12) , 7640-7642
- https://doi.org/10.1063/1.349727
Abstract
No abstract availableThis publication has 18 references indexed in Scilit:
- Effects of beam parameters on excimer laser deposition of YBa2Cu3O7−δApplied Physics Letters, 1990
- Laser patterning and critical current measurements of submicrometer lines of Y-Ba-Cu-OApplied Physics Letters, 1989
- Laser-assisted etching of YBa2Cu3O7−δApplied Physics Letters, 1989
- Nonaqueous chemical depth profiling of YBa2Cu3O7−xApplied Physics Letters, 1989
- Narrow tracks in YBa2Cu3O7 thin films defined by laser ablationApplied Physics Letters, 1989
- Direct laser writing of superconducting patterns into semiconducting ceramic Y-Ba-Cu-OApplied Physics A, 1988
- Preparation, patterning, and properties of thin YBa2Cu3O7−δ filmsApplied Physics Letters, 1988
- Reversible Resistivity Control of Ba2YCu3O7-δ Thin Films by Laser AnnealingJapanese Journal of Applied Physics, 1988
- Direct laser writing of superconducting patterns of Y1Ba2Cu3O7−δApplied Physics Letters, 1988
- Reactive ion beam etching of Y-Ba-Cu-O superconductorsApplied Physics Letters, 1988