Positive secondary ion yields under In+- and O2+-bombardement
- 1 January 1983
- journal article
- Published by Elsevier in International Journal of Mass Spectrometry and Ion Physics
- Vol. 46, 503-506
- https://doi.org/10.1016/0020-7381(83)80162-4
Abstract
No abstract availableKeywords
This publication has 16 references indexed in Scilit:
- Comparison of secondary ion yield data from amorphous and polycrystalline iron-based alloysAnalytical Chemistry, 1982
- Scanning microbeam using a liquid metal ion sourceJournal of Vacuum Science and Technology, 1982
- A Further step towards three-dimensional elemental analysis of solidsMicrochimica Acta, 1981
- GaAs MESFET fabrication using maskless ion implantationIEEE Electron Device Letters, 1981
- High-resolution, ion-beam processes for microstructure fabricationJournal of Vacuum Science and Technology, 1979
- Evaluation of a cesium positive ion source for secondary ion mass spectrometryAnalytical Chemistry, 1977
- On the qunatum theory of the emission of secondary ionsPhysics Letters A, 1976
- Energy dependence of the secondary ion yield of metals and semiconductorsSurface Science, 1975
- A quantum-mechanical model for the ionization and excitation of atoms during sputteringSurface Science, 1973
- Untersuchungen zur Emission positiver Sekundärionen aus festen Targets. Die Brauchbarkeit der Ionenbeschuß-Ionenquelle in der MassenspektroskopieZeitschrift für Naturforschung A, 1967