Smooth 3-D shaping of thick resists by means of gray tone lithography
- 20 January 2003
- proceedings article
- Published by Institute of Electrical and Electronics Engineers (IEEE)
- Vol. 1, 217-220
- https://doi.org/10.1109/smicnd.1999.810501
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Experiments for 3-D structuring of thick resists by gray tone lithographyMaterials Science in Semiconductor Processing, 2000
- New method to design halftone mask for the fabrication of continuous microrelief structurePublished by SPIE-Intl Soc Optical Eng ,1999
- General aspheric refractive micro-optics fabricated by optical lithography using a high energy beam sensitive glass gray-level maskJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1996
- Simulation and experimental study of gray-tone lithography for the fabrication of arbitrarily shaped surfacesPublished by Institute of Electrical and Electronics Engineers (IEEE) ,1994