Sculpting of three-dimensional nano-optical structures in silicon

15 December 2003

journal article
research article
Published by AIP Publishing in Applied Physics Letters

Vol. 83 (24) , 4909-4911
https://doi.org/10.1063/1.1634384

Abstract

Separation by IMplantation of OXygen (SIMOX) based process has been developed to sculpt three-dimensionally integrated nano-optical waveguidingstructures in silicon. An approach, based on the implantation of oxygen ions into a silicon substrate, patterned with thermal oxide, has been adopted to synthesize low loss buried rib waveguides in a single implantation step of thickness 286 nm and widths varying from 2 μm to 12 μm. These waveguides show propagation losses in the range of 3–4 dB/cm. The capability of the process to sculpt three-dimensional (3-D) structures has also been demonstrated by defining rib waveguides on the top silicon layer.

Keywords

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