Function of Substrate Bias Potential for Formation of Cubic Boron Nitride Films in Plasma CVD Technique
- 1 September 1987
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 26 (9A) , L1435-1436
- https://doi.org/10.1143/jjap.26.l1435
Abstract
No abstract availableKeywords
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