Ellipsometric study of low-temperature silicon surface cleaning during the process of reactive ionized cluster beam deposition
- 1 January 1989
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 168 (1) , 103-111
- https://doi.org/10.1016/0040-6090(89)90693-7
Abstract
No abstract availableKeywords
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