Evidence of oxygen bubbles formed within anodic films on aluminium-copper alloys
- 1 October 1997
- journal article
- research article
- Published by Taylor & Francis in Philosophical Magazine A
- Vol. 76 (4) , 729-741
- https://doi.org/10.1080/01418619708214206
Abstract
The composition of the barrier anodic film formed at 50 A m−2 to 200 V on solution-treated Al-l at.% Cu alloy in ammonium pentaborate electrolyte at 293 K has been investigated by Rutherford backscattering spectroscopy and nuclear reaction analysis. The film contains about 14% more oxygen in comparison with that expected for an anodic alumina film as usually formed on high purity aluminium under similar conditions. The excess oxygen is attributed to the electrochemical production of oxygen near the alloy-film interface during growth of the film. The formation of the oxygen is probably linked to the oxidation of copper in a thin alloy layer, highly enriched in copper, immediately beneath the anodic film. Most of the oxygen appears to reside in bubbles, of dimensions from about 5 to 250 nm. within the inner part of the film, which are revealed in the transmission electron microscope. The estimated pressure of the oxygen gas within the bubbles is ≈ 150 MPa.Keywords
This publication has 19 references indexed in Scilit:
- The importance of surface treatment to the anodic oxidation behaviour of AlCu alloysCorrosion Science, 1996
- Barrier-type anodic film formation on an Al-3.5 wt% Cu alloyCorrosion Science, 1996
- Development of Surface Impurity Segregation during Dissolution of AluminumJournal of the Electrochemical Society, 1996
- Oxidation of copper and mobility of copper ions during anodizing of an Al—1.5 wt.% Cu alloySurface and Interface Analysis, 1995
- Barrier‐Type anodic films on aluminium in aqueous borate solutions: 1—Film density and stopping power of anodic alumina films for alpha particlesSurface and Interface Analysis, 1983
- Barrier‐type anodic films on aluminium in aqueous borate solutions: 2—Film compositions by Rutherford backscattering spectroscopy and nuclear reaction methodsSurface and Interface Analysis, 1983
- The electrical breakdown during anodizing of high purity aluminium in borate solutionsThin Solid Films, 1982
- Precision absolute thin film standard reference targets for nuclear reaction microanalysis of oxygen isotopes: Part I: 16O standardsNuclear Instruments and Methods, 1978
- The Use of Rutherford Backscattering to Study the Behavior of Ion-Implanted Atoms During Anodic Oxidation of Aluminum: Ar, Kr, Xe, K, Rb, Cs, Cl, Br, and lJournal of the Electrochemical Society, 1973
- HIGH RESISTANCE ANODIC OXIDE FILMS ON ALUMINIUMCanadian Journal of Chemistry, 1966