Steady-state thermal uniformity and gas flow patterns in a rapid thermal processing chamber
- 1 January 1991
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Semiconductor Manufacturing
- Vol. 4 (1) , 14-20
- https://doi.org/10.1109/66.75859
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
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