Preparation of Nd-Doped SiO₂Glasses by Axial Injection Plasma Torch CVD and Their Fluorescence Properties

This publication has 5 references indexed in Scilit:

• Fluorescence and its Nd³⁺ Concentration Dependence of Nd-Doped SiO₂ Glasses Prepared by Plasma Torch CVD
  Japanese Journal of Applied Physics, 1983
• Preparation of Nd-Doped SiO₂ Glass by Plasma Torch CVD
  Japanese Journal of Applied Physics, 1982
• New design of a radio-frequency plasma torch
  Plasma Chemistry and Plasma Processing, 1981
• The induced plasma torch as a high‐temperature chemical reactor. I. Oxidation of silicon tetrachloride
  Journal of Chemical Technology & Biotechnology, 1969
• Growth of Refractory Crystals Using the Induction Plasma Torch
  Journal of Applied Physics, 1961