Highly Transparent and Conductive Zinc-Stannate Thin Films Prepared by RF Magnetron Sputtering
- 1 December 1994
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 33 (12A) , L1693-1696
- https://doi.org/10.1143/jjap.33.l1693
Abstract
No abstract availableKeywords
This publication has 14 references indexed in Scilit:
- Preparation, structure and gas-sensing properties of ultramicro ZnSnO3 powderSensors and Actuators B: Chemical, 1993
- The Electrical and Optical Properties of the ZnO-SnO2 Thin Films Prepared by RF Magnetron SputteringPhysica Status Solidi (a), 1992
- Heat treatment in hydrogen gas and plasma for transparent conducting oxide films such as ZnO, SnO2 and indium tin oxideThin Solid Films, 1989
- Reactive Ion Etching of Transparent Conducting Tin Oxide Films Using Electron Cyclotron Resonance Hydrogen PlasmaJapanese Journal of Applied Physics, 1988
- Highly Conducting and Transparent SnO2 Thin Films Prepared by RF Magnetron Sputtering on Low-Temperature SubstratesJapanese Journal of Applied Physics, 1988
- Highly Conductive and Transparent Silicon Doped Zinc Oxide Thin Films Prepared by RF Magnetron SputteringJapanese Journal of Applied Physics, 1986
- Tin- and indium-doped zinc oxide films prepared by RF magnetron sputteringSolar Energy Materials, 1986
- Efficiency of the a-Si:H solar cell and grain size of SnO2transparent conductive filmIEEE Electron Device Letters, 1983
- Transparent conductors—A status reviewThin Solid Films, 1983
- Degradation of ITO Film in Glow-Discharge PlasmaJapanese Journal of Applied Physics, 1981