The effects of deposition variables on deposition rate in the chemical vapour deposition of silicon nitride
- 1 December 1987
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 155 (1) , 87-95
- https://doi.org/10.1016/0040-6090(87)90455-x
Abstract
No abstract availableKeywords
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