50 nm linewidth platinum sidewall lithography by effusive-source metal precursor chemical deposition and ion-assisted etching
- 21 October 1991
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 59 (17) , 2192-2194
- https://doi.org/10.1063/1.106070
Abstract
Vertical platinum sidewall structures 50 nm thick and 700 nm tall have been fabricated by Pt deposition from the thermal decomposition of tetrakis-(trifluorophosphine)-platinum using an effusive gas source followed by ion-assisted etching. Scanning electron microscope micrographs show that the sidewalls have high uniformity, very fine grains, and very sharp contours, demonstrating a high degree of conformal deposition. Scanning Auger microscopy confirms the presence of platinum only in the sidewalls. X-ray photoelectron spectroscopy analysis of the as-deposited platinum film reveals no detectable impurity and Scotch tape test shows good bonding of the film. The method is suitable to large-scale processing.Keywords
This publication has 2 references indexed in Scilit:
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- Synthesis of Tetrakis(trifluorophosphine)‐platinum(0) and Tetrakis(trifluorophosphine)‐palladium(0)Angewandte Chemie International Edition in English, 1965