Novel InGaAs/GaAs Quantum Dot Structures Formed in Tetrahedral-Shaped Recesses on (111)B GaAs Substrate Using Metalorganic Vapor Phase Epitaxy
- 1 August 1995
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 34 (8S)
- https://doi.org/10.1143/jjap.34.4384
Abstract
We report a novel GaAs/InGaAs/GaAs quantum dot structure formed in a tetrahedral-shaped recess (TSR) pattered on a (111)B GaAs substrate with anisotropic chemical etching. The pseudomorphic heterostructure shows two clear photoluminescence (PL) peaks, which are attributed to an In anisotropic incorporation on (111)B compared to (111)A. Cathodoluminescence at a lower energy peak with InGaAs of 2.5 nm shows bright image at the bottom of TSRs, which indicates the local minimum of potential energy is at the bottom of the TSR.Keywords
This publication has 13 references indexed in Scilit:
- Self-Formed In0.5Ga0.5As Quantum Dots on GaAs Substrates Emitting at 1.3 µmJapanese Journal of Applied Physics, 1994
- Room-temperature single-electron memoryIEEE Transactions on Electron Devices, 1994
- Electron motion on a curved interfaceSurface Science, 1992
- Intrinsic mechanism for the poor luminescence properties of quantum-box systemsPhysical Review B, 1991
- Selective growth of InP/GaInAs in LP-MOVPE and MOMBE/CBEJournal of Crystal Growth, 1991
- Phonon scattering and energy relaxation in two-, one-, and zero-dimensional electron gasesPhysical Review B, 1990
- First stages of the MBE growth of InAs on (001)GaAsJournal of Crystal Growth, 1987
- RHEED oscillation studies of MBE growth kinetics and lattice mismatch strain-induced effects during InGaAs growth on GaAs(100)Journal of Vacuum Science & Technology B, 1984
- Defects in epitaxial multilayers I. Misfit dislocationsJournal of Crystal Growth, 1974
- Preferential Etching and Etched Profile of GaAsJournal of the Electrochemical Society, 1971