Oxygen Clusters in Quenched Czochralski-Si Studied by Infrared Spectroscopy and Positron Annihilation

Abstract
We studied the formation of oxygen clusters in quenched Czochralski (Cz)-grown silicon crystals. The formation and the dissociation of vacancy-oxygen complexes introduced by electron irradiation (3 MeV, 1×1018 e-/ cm2) were studied by infrared spectroscopy and the positron annihilation technique. From the annealing behavior of vacancy-oxygen complexes, it is found that oxygen clusters are introduced by quenching. These clusters are nuclei for enhanced oxygen precipitation in quenched Cz-grown silicon crystals.