Preparation and properties of antimony-doped tin oxide films deposited by R.F. reactive sputtering
- 1 March 1985
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 125 (1-2) , 33-38
- https://doi.org/10.1016/0040-6090(85)90391-8
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
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