Iron as a thermal defect in silicon
- 1 September 1978
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 33 (5) , 433-435
- https://doi.org/10.1063/1.90412
Abstract
Thermally treated silicon contains iron which can be frozen on interstitial sites by quenching. EPR, combined with neutronactivation analysis of heat‐treated and as‐grown silicon, shows that the iron diffuses into the crystal from sources outside the specimen. It can be found mostly in the T d interstitial site. The untreated floating‐zone silicon includes only 1013 Fe/cm3.Keywords
This publication has 5 references indexed in Scilit:
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