Reactions of Thin Metal Films with Si or SiO2 Substrates
- 1 January 1974
- book chapter
- Published by Springer Nature
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Characteristics of aluminum-titanium electrical contacts on siliconApplied Physics Letters, 1973
- Principles and applications of ion beam techniques for the analysis of solids and thin filmsThin Solid Films, 1973
- X-ray study of interdiffusion in bimetallic Cu–Au filmsJournal of Applied Physics, 1972
- Seeman–Bohlin X-ray diffractometer for thin filmsJournal of Applied Crystallography, 1970