STM-induced H atom desorption from Si(100): isotope effects and site selectivity
- 1 July 1996
- journal article
- Published by Elsevier in Chemical Physics Letters
- Vol. 257 (1-2) , 148-154
- https://doi.org/10.1016/0009-2614(96)00518-0
Abstract
No abstract availableKeywords
This publication has 17 references indexed in Scilit:
- Vibrational dynamics of the Si–H stretching modes of the Si(100)/H:2×1 surfaceThe Journal of Chemical Physics, 1995
- Theoretical study of the mechanism of recombinative hydrogen desorption from the monohydride phase of Si(100): The role of defect migrationThe Journal of Chemical Physics, 1994
- Nanoscale patterning and oxidation of H-passivated Si(100)-2×1 surfaces with an ultrahigh vacuum scanning tunneling microscopeApplied Physics Letters, 1994
- Scanning tunneling microscopy (STM) studies of the chemical vapor deposition of Ge on Si(111) from Ge hydrides and a comparison with molecular beam epitaxyThe Journal of Chemical Physics, 1994
- A local-Gaussian approximation for the propagation of a classical distribution functionThe Journal of Chemical Physics, 1991
- Atomic-scale conversion of clean Si(111):H-1×1 to Si(111)-2×1 by electron-stimulated desorptionPhysical Review Letters, 1990
- Lifetime of an adsorbate-substrate vibration: H on Si(111)Physical Review Letters, 1990
- Atom-resolved surface chemistry using the scanning tunneling microscopeThe Journal of Physical Chemistry, 1990
- Mechanistic Studies of Chemical Vapor DepositionAnnual Review of Physical Chemistry, 1987
- Electronic structures of the monohydride (2×1):H and the dihydrideSi(001) surfaces studied by angle-resolved electron-energy-loss spectroscopyPhysical Review B, 1983