Stability of plasma deposited thin film transistors — comparison of amorphous and microcrystalline silicon
- 1 February 2001
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 383 (1-2) , 117-121
- https://doi.org/10.1016/s0040-6090(00)01581-9
Abstract
No abstract availableKeywords
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