Performance, uniformity, and yield of 850-nm VCSELs deposited by MOVPE

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Abstract
Vertical-cavity surface-emitting lasers (VCSELs) emitting near 850 nm and fabricated with the metal-organic vapor phase epitaxy (MOVPE) epitaxial growth technique and a planar proton implant process have been demonstrated with excellent performance, uniformity, and yield across a 3-in wafer. Four thousand lasers were tested on a three-inch-diameter wafer, with a yield of 99.8%. This translates into a yield of 94% for fully functional 34/spl times/1 arrays. The average threshold current, threshold voltage, and dynamic resistance at 10 mA operating current were 3.07 mA, 1.59 V, and 34 ohms, respectively. Uniformity of better than /spl plusmn/9% in threshold current, /spl plusmn/1% in threshold voltage, and /spl plusmn/1.5% in maximum optical output power across a 34-element array was demonstrated.