Analysis of frequency-dependent loss data in amorphous silicon and germanium
- 1 January 1985
- journal article
- Published by Taylor & Francis in Philosophical Magazine Part B
- Vol. 51 (1) , L7-L12
- https://doi.org/10.1080/01418618508242770
Abstract
Loss peaks are observed in both the real and imaginary parts of the a.c. conductivity of a-Si and a-Ge samples at around liquid nitrogen temperatures. The data is plotted in a way suggested by a recent scaling theory which yields almost universal curves for the loss peaks. The decay length α+1 is the only adjustable parameter involved in the comparison between theory and experiment. Good agreement is obtained with α+1 = 1·5 nm for a pure a-Si sample and with α+1 decreasing from 2·5 to 0·25 nm with increasing hydrogen concentration for hydrogenated a-Ge samples.Keywords
This publication has 14 references indexed in Scilit:
- Frequency-dependent loss in sputtered amorphous germanium films Measurements at low temperaturesPhilosophical Magazine Part B, 1985
- The effect of hydrogen on a.c. and d.c. conduction in sputtered amorphous germanium films A temperature shiftPhilosophical Magazine Part B, 1983
- Frequency-dependent loss in amorphous semiconductorsAdvances in Physics, 1982
- A.c. loss in sputtered hydrogenated amorphous germanium measurements at around liquid-nitrogen temperaturesPhilosophical Magazine Part B, 1982
- Theory of electronic hopping transport in disordered materialsPhilosophical Magazine Part B, 1980
- Use of hydrogenation in the study of the transport properties of amorphous germaniumPhysical Review B, 1976
- A.c. conductivity of amorphous germanium by time-domain spectroscopyPhilosophical Magazine, 1976
- Hopping Conductivity in Disordered SystemsPhysical Review B, 1971
- Polarons in crystalline and non-crystalline materialsAdvances in Physics, 1969
- Impurity Conduction at Low ConcentrationsPhysical Review B, 1960