Determination of sputtering yields by a new procedure for depth profiling of multilayered structures
- 1 March 1984
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 2 (1-3) , 670-673
- https://doi.org/10.1016/0168-583x(84)90289-1
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Sputtering-yield studies on silicon and silver targetsRadiation Effects, 1973
- Sputtering and Strain of Silicon by Ion ImplantationJournal of Applied Physics, 1971
- New Method for Measuring Sputtering in the Region Near ThresholdReview of Scientific Instruments, 1961