Deposited silica waveguide for intergrated optical circuits
- 1 April 1981
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 38 (7) , 483-485
- https://doi.org/10.1063/1.92426
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Selective etching of Si relative to SiO2 without undercutting by CBrF3 plasmaApplied Physics Letters, 1980
- Calorimetric measurement of LiNbO3 waveguide absorption lossesApplied Physics Letters, 1979
- Etching Characteristics of Various Materials by Plasma Reactive Sputter EtchingJapanese Journal of Applied Physics, 1978