Dynamic sheath model of collisionless multispecies plasma immersion ion implantation
- 1 July 1995
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 78 (1) , 55-60
- https://doi.org/10.1063/1.360640
Abstract
No abstract availableThis publication has 17 references indexed in Scilit:
- Plasma immersion ion implantation doping experiments for microelectronicsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1994
- The response of a microwave multipolar bucket plasma to a high-voltage pulse with finite rise timeIEEE Transactions on Plasma Science, 1992
- Plasma immersion ion implantation doping using a microwave multipolar bucket plasmaIEEE Transactions on Electron Devices, 1992
- PMOS integrated circuit fabrication using BF3 plasma immersion ion implantationJournal of Electronic Materials, 1992
- The response of a microwave multipolar bucket plasma to a high voltage pulseIEEE Transactions on Plasma Science, 1991
- Plasma immersion ion implantation for ULSI processingNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1991
- Model of plasma source ion implantation in planar, cylindrical, and spherical geometriesJournal of Applied Physics, 1990
- Model of plasma immersion ion implantationJournal of Applied Physics, 1989
- Plasma source ion-implantation technique for surface modification of materialsJournal of Applied Physics, 1987
- Sheath thickness and potential profiles of ion-matrix sheaths for cylindrical and spherical electrodesJournal of Applied Physics, 1987