Abstract
We present a unit which enables us to evaporate two different metals, rare gas, and atomic or molecular hydrogen at the same time onto a substrate held at a temperature of about 5 K. The deposition rates of the metals and the rare gas are measured by a quartz oscillator. The hydrogen deposition rate is calibrated by using the H-concentration dependence of the superconducting transition temperature in Pd–H and Al–H, known from ion-implantation experiments.

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