Comparative in situ study of tantalum thin film oxidation in isothermal and nonisothermal conditions
- 1 January 1988
- Vol. 38 (1) , 15-19
- https://doi.org/10.1016/0042-207x(88)90251-5
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Structure and electrical properties of Ta films sputtered in ArO2Thin Solid Films, 1972
- Reactivity sputtered tantalum thin film resistors Part 1. Physical and electrical propertiesThin Solid Films, 1971
- THE INITIAL OXIDATION OF NICKELCanadian Journal of Physics, 1955