Cesium hydroxide (CsOH): a useful etchant for micromachining silicon
- 6 January 2003
- conference paper
- Published by Institute of Electrical and Electronics Engineers (IEEE)
Abstract
The CsOH-H/sub 2/O etchant system was studied over a range of concentrations (10%-76% by weight) and temperatures (25-90 degrees C). The etch rates ofKeywords
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