Rhombohedral distortion of EuS epitaxial films on Si(111) substrates
- 1 August 1987
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 151 (2) , 191-198
- https://doi.org/10.1016/0040-6090(87)90232-x
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
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- X-ray mirror reflectivities from 3.8 to 50 keV (3.3 to 0.25 Å) Part II—Pt, Si and other materialsNuclear Instruments and Methods in Physics Research, 1982
- Precision lattice constant determinationActa Crystallographica, 1960
- Interferenz von Röntgenstrahlen an dünnen SchichtenAnnalen der Physik, 1931