Measurements of x-ray induced absorption in high-purity silica glass by using an ultrasensitive spectrophotometer
- 1 October 1988
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 105 (1-2) , 114-122
- https://doi.org/10.1016/0022-3093(88)90345-6
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
- Effects of heat treatment on X-ray induced absorption and luminescence in synthetic silica glassJournal of Non-Crystalline Solids, 1986
- Defect structure of glassesJournal of Non-Crystalline Solids, 1985
- Photoinduced paramagnetic defects in amorphous silicon dioxidePhysical Review B, 1984
- Intrinsic defects generation mechanisms in fused silicaJournal of Non-Crystalline Solids, 1980
- Fundamental Defect Centers in Glass: The Peroxy Radical in Irradiated, High-Purity, Fused SilicaPhysical Review Letters, 1979
- Electronic structure ofcenters in SiPhysical Review B, 1975
- Light scattering in a number of optical grade glassesJournal of Non-Crystalline Solids, 1974
- Spectrophotometric studies of ultra low loss optical glasses II: double beam methodJournal of Physics E: Scientific Instruments, 1969
- Trapped Electrons in Irradiated Quartz and Silica: II, Electron Spin ResonanceJournal of the American Ceramic Society, 1960
- Trapped Electrons in Irradiated Quartz and Silica: I, Optical AbsorptionJournal of the American Ceramic Society, 1960