Additive lithography for fabrication of diffractive optics
- 10 October 2002
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 41 (29) , 6176-6181
- https://doi.org/10.1364/ao.41.006176
Abstract
An innovative fabrication technique is introduced that is based on multiple-exposure techniques for micro-optics fabrication. This method utilizes various exposure times and combinations of binary and analog photo masks to sculpture complex photoresist profiles. It also demonstrates the fabrication of analog structures from the multilevel structures thus formed by using resist reflow.Keywords
This publication has 2 references indexed in Scilit:
- Photoresist characterization and linearization procedure for the gray-scale fabrication of diffractive optical elementsApplied Optics, 2001
- Multilevel diffractive optical elements fabricated with a single amplitude - phase maskPure and Applied Optics: Journal of the European Optical Society Part A, 1997