Preparation of Pb(Ti,Zr)O3/RuO2 multilayers in situ by pulsed laser ablation deposition
- 1 September 1997
- journal article
- Published by Taylor & Francis in Integrated Ferroelectrics
- Vol. 18 (1-4) , 397-404
- https://doi.org/10.1080/10584589708221716
Abstract
RuO2/PbZr0.52Ti0.48O3 multilayers have been prepared by pulsed laser deposition and characterised by Grazing Incident Angle Bragg Diffraction and scanning electron microscopy. The results are correlated with the different deposition conditions and post-growth thermal annealing. The structure of the paraelectric pyrochlore phase (Pb-2(Zr,Ti)(2)O-6) and its stability relative to the ferroelectric perovskite is discussedKeywords
This publication has 5 references indexed in Scilit:
- Microstructural Characterisation of Pb(Zr0.52Ti0.48)O3 Thin Films Deposited on RuO2 Electrodes by Laser AblationMRS Proceedings, 1996
- In-situ sputter deposition of PT and PZT films on Platinum and RuO2 electrodesMicroelectronic Engineering, 1995
- Fatigue behaviour of ferroelectric thin films for nonvolatile memoriesIntegrated Ferroelectrics, 1995
- Contribution of electrodes and microstructures to the electrical properties of Pb(Zr0.53Ti0.47)O3 thin film capacitorsJournal of Materials Research, 1994
- In situ diagnostics of pulsed laser deposition of ferroelectric Pb(Ti0.48Zr0.52)O3 on SiApplied Physics Letters, 1993