Yellow luminescence and related deep levels in unintentionally doped GaN films
- 15 April 1999
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 59 (15) , 9748-9751
- https://doi.org/10.1103/physrevb.59.9748
Abstract
The deep level energy distribution associated with the well-known “yellow luminescence” in GaN is studied by means of two complementary deep level techniques: photoluminescence and surface photovoltage spectroscopy. The combined experimental results show that the yellow luminescence is due to capture of conduction band electrons, or electrons from shallow donors (with a maximum depth on the order of the thermal energy) by a deep acceptor level with a broad energy distribution, centered at ∼2.2 eV below the conduction band edge. In addition, the results show that the density of yellow luminescence related states possesses a significant surface component.Keywords
This publication has 21 references indexed in Scilit:
- Effect of reactor geometry and growth parameters on the uniformity and material properties of grown by hydride vapor-phase epitaxyJournal of Crystal Growth, 1997
- Nitride-based semiconductors for blue and green light-emitting devicesNature, 1997
- Yellow luminescence and related deep states in undoped GaNPhysical Review B, 1997
- Depth-resolved and excitation power dependent cathodoluminescence study of GaN films grown by metalorganic chemical vapor depositionApplied Physics Letters, 1997
- Towards the Identification of the Dominant Donor in GaNPhysical Review Letters, 1995
- Nonlinear excitation of capillary waves by the Marangoni motion induced with a modulated laser beamPhysical Review B, 1995
- Emerging gallium nitride based devicesProceedings of the IEEE, 1995
- Distinction between surface and bulk states in surface-photovoltage spectroscopyPhysical Review B, 1994
- Mechanism of Yellow Luminescence in GaNJapanese Journal of Applied Physics, 1980
- Surface Photovoltage Spectroscopy—A New Approach to the Study of High-Gap Semiconductor SurfacesJournal of Vacuum Science and Technology, 1973